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Ti1−xAlxN coatings by plasma-assisted chemical vapour deposition using a TiCl4/AlCl3/N2/H2/Ar gas mixture

✍ Scribed by Kwang Ho Kim; Sung H. Lee

Publisher: Springer
Year: 1995
Tongue: English
Weight: 218 KB
Volume: 14
Category: Article
ISSN: 0261-8028
DOI: 10.1007/bf00633152

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