𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Spatial distribution of defects in ion-implanted and annealed Si: The RP/2 effect

✍ Scribed by R Kögler; R.A Yankov; J.R Kaschny; M Posselt; A.B Danilin; W Skorupa


Book ID
114170336
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
326 KB
Volume
142
Category
Article
ISSN
0168-583X

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES