Defects remaining in MeV-ion-implanted and annealed Si away from the peak of the nuclear energy deposition profile

✍ Scribed by R. Kögler; R.A. Yankov; M. Posselt; A.B. Danilin; W. Skorupa

• Book ID: 114170514
• Publisher: Elsevier Science
• Year: 1999
• Tongue: English
• Weight: 208 KB
• Volume: 147
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/s0168-583x(98)00534-5