Organic-Inorganic hybrid-polymer thin films were deposited on silicon(100) substrates by plasma enhanced chemical vapor deposition (PECVD) method using monomer precursors of the organic-inorganic hybrid polymers. Ethylcyclohexane (ECH) and tetraethoxysilane (TEOS) were utilized as organic and inorga
Sorption and permeation characteristics of hybrid organosilicon thin films deposited by PECVD
✍ Scribed by Florence Bosc; José Sanchez; Vincent Rouessac; Jean Durand
- Book ID
- 114397081
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 188 KB
- Volume
- 32
- Category
- Article
- ISSN
- 1383-5866
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