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Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD

✍ Scribed by V. Cech; J. Studynka; B. Cechalova; J. Mistrik; J. Zemek

Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
213 KB
Volume
202
Category
Article
ISSN
0257-8972

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✦ Synopsis

Plasma-polymerized films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system operated in a pulsed regime. Thin films deposited under the same deposition conditions but with different thicknesses (9.5 nm-10.5 Β΅m) were analyzed with respect to mechanical, optical, and chemical properties. All the films exhibited a layered structure. The overlayer at the film surface with a thickness (0.9-34 nm) dependent on the sample thickness was revealed by AFM, nanoindentation, and ellipsometry. A gradient behavior of the refractive index and the Young's modulus within the overlayer was related to the surface morphology of the films. A gradient interlayer at the substrate was also discussed.

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