𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Electrical and optical properties of ZnO films deposited by ECR-PECVD

✍ Scribed by Choi, S. Y. ;Kang, M. J. ;Park, T. J. ;Tap, R. ;Schoemaker, S. ;Willert-Porada, M.


Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
304 KB
Volume
203
Category
Article
ISSN
0031-8965

No coin nor oath required. For personal study only.

✦ Synopsis


Abstract

The effect of bias voltage on characteristics of ZnO thin films deposited by the electron cyclotron resonance plasma‐enhanced chemical vapor deposition (ECR‐PECVD) method was investigated. The structural, optical and electrical properties of ZnO thin films were studied as a function of O~2~/dielthylzinc ratio and applied bias voltage. Applying –600 V bias voltage on the substrate during deposition can reduce the sheet resistance by a magnitude of 10^4^ without deteriorating the optical transmittance. The optical band gap was increased from 3.36 to 3.54 eV with bias voltage increase. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)


📜 SIMILAR VOLUMES


Electrical and optical properties of bor
✍ Li, Zhe ;Zhang, Xiwen ;Han, Gaorong 📂 Article 📅 2010 🏛 John Wiley and Sons 🌐 English ⚖ 221 KB

## Abstract Boron‐doped nanocrystalline silicon (nc‐Si:H) films were deposited by plasma‐enhanced chemical vapor deposition (PECVD). A variety of techniques, including X‐ray diffraction (XRD), Raman scattering (RS), UV–Vis–NIR spectroscopy and conductivity measurement were used to characterize the

Structural, electrical and optical prope
✍ M. Sahal; B. Hartiti; A. Ridah; M. Mollar; B. Marí 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 357 KB

Thin films of intrinsic and Al-doped ZnO were prepared by the sol-gel technique associated with spin coating onto glass substrates. Zinc acetate dehydrate, ethanol and monoethanolamine were used as a starting material, solvent and stabiliser, respectively. Structural, electrical and optical characte

Correlation between mechanical, optical
✍ V. Cech; J. Studynka; B. Cechalova; J. Mistrik; J. Zemek 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 213 KB

Plasma-polymerized films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system operated in a pulsed regime. Thin films deposited under the same deposition conditions but with different thicknesses (9.5 nm-10.5 µm) we