𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Optical properties of nanocrystalline silicon deposited by PECVD

✍ Scribed by M. R. Esmaeili-Rad; A. Sazonov; A. G. Kazanskii; A. A. Khomich; A. Nathan


Publisher
Springer US
Year
2007
Tongue
English
Weight
466 KB
Volume
18
Category
Article
ISSN
0957-4522

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Electrical and optical properties of bor
✍ Li, Zhe ;Zhang, Xiwen ;Han, Gaorong πŸ“‚ Article πŸ“… 2010 πŸ› John Wiley and Sons 🌐 English βš– 221 KB

## Abstract Boron‐doped nanocrystalline silicon (nc‐Si:H) films were deposited by plasma‐enhanced chemical vapor deposition (PECVD). A variety of techniques, including X‐ray diffraction (XRD), Raman scattering (RS), UV–Vis–NIR spectroscopy and conductivity measurement were used to characterize the

Electrical and optical properties of ZnO
✍ Choi, S. Y. ;Kang, M. J. ;Park, T. J. ;Tap, R. ;Schoemaker, S. ;Willert-Porada, πŸ“‚ Article πŸ“… 2006 πŸ› John Wiley and Sons 🌐 English βš– 304 KB

## Abstract The effect of bias voltage on characteristics of ZnO thin films deposited by the electron cyclotron resonance plasma‐enhanced chemical vapor deposition (ECR‐PECVD) method was investigated. The structural, optical and electrical properties of ZnO thin films were studied as a function of

Correlation between mechanical, optical
✍ V. Cech; J. Studynka; B. Cechalova; J. Mistrik; J. Zemek πŸ“‚ Article πŸ“… 2008 πŸ› Elsevier Science 🌐 English βš– 213 KB

Plasma-polymerized films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system operated in a pulsed regime. Thin films deposited under the same deposition conditions but with different thicknesses (9.5 nm-10.5 Β΅m) we