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Structure and properties of hydrogenated amorphous silicon carbide thin films deposited by PECVD

โœ Scribed by Yiying Zhang; Piyi Du; Ran Zhang; Gaorong Han; Wenjian Weng


Book ID
116669999
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
178 KB
Volume
354
Category
Article
ISSN
0022-3093

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Laser annealing study of PECVD deposited
โœ U. Coscia; G. Ambrosone; F. Gesuele; V. Grossi; V. Parisi; S. Schutzmann; D.K. B ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 524 KB

The influence of carbon content on the crystallization process has been investigated for the excimer laser annealed hydrogenated amorphous silicon carbon alloy films deposited by Plasma Enhanced Chemical Vapour Deposition (PECVD) technique, using silane methane gas mixture diluted in helium, as well