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Simulations of diffusion barrier deposition on porous low-k films

โœ Scribed by Z.S. Yanovitskaya; A.V. Zverev; D. Shamiryan; K. Maex


Book ID
108411325
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
270 KB
Volume
70
Category
Article
ISSN
0167-9317

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๐Ÿ“œ SIMILAR VOLUMES


Pinhole density measurements of barriers
โœ D Shamiryan; T Abell; Q.T Le; K Maex ๐Ÿ“‚ Article ๐Ÿ“… 2003 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 163 KB

Evaluation of diffusion barrier integrity is an important issue in advanced interconnects. A diffusion barrier separating Cu from low-k must be as thin as possible and must not contain pinholes. We have developed a method for measuring pinhole density in diffusion barriers deposited on low-k materia