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Simulation study of interface traps and bulk traps in n++GaN/InAlN/AlN/GaN high electron mobility transistors

✍ Scribed by Molnár, M.; Donoval, D.; Kuzmík, J.; Marek, J.; Chvála, A.; Príbytný, P.; Mikolášek, M.; Rendek, K.; Palankovski, V.


Book ID
125451810
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
574 KB
Volume
312
Category
Article
ISSN
0169-4332

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## Abstract We used deep level transient spectroscopy (DLTS) and HR‐TEM techniques to study traps and defects in pre‐ and post‐stressed AlGaN/GaN high electron mobility transistors (HEMTs) grown by MOCVD on semi‐insulating SiC substrates. DLTS identified two dominant traps with activation energies