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Simulation of the transport of sputtered atoms and effects of processing conditions

โœ Scribed by A. Settaouti; L. Settaouti

Book ID
104002410
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
933 KB
Volume
254
Category
Article
ISSN
0169-4332

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Three-dimensional Monte Carlo simulation
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โœ P.K. Petrov; V.A. Volpyas; R.A. Chakalov ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 197 KB

An algorithm for Monte Carlo simulation of sputtered atom transport during ion-plasma sputtering was developed. The experimentally determined initial energy distribution of sputtered atoms, the influence of the background gas mixture and the real equipment geometry of the magnetron sputtering system