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Monte Carlo simulation of transport process of the sputtered species in the facing target sputtering technique

โœ Scribed by V. Abhilash; R. Balu; S. Balaji; S. Senthil Nathan; S. Mohan

Book ID
116374187
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
370 KB
Volume
30
Category
Article
ISSN
0927-0256

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Three-dimensional Monte Carlo simulation
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โœ P.K. Petrov; V.A. Volpyas; R.A. Chakalov ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 197 KB

An algorithm for Monte Carlo simulation of sputtered atom transport during ion-plasma sputtering was developed. The experimentally determined initial energy distribution of sputtered atoms, the influence of the background gas mixture and the real equipment geometry of the magnetron sputtering system