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Monte Carlo simulation of the particle transport process in sputter deposition

โœ Scribed by T. Motohiro; Y. Taga


Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
644 KB
Volume
112
Category
Article
ISSN
0040-6090

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Investigation of ion beam sputtering pro
โœ Michio Mizutani; Kimihiro Sasaki; Tomonobu Hata ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 547 KB

A simulation of ion beam sputtering for Si and Ge is carried out and the simulation results are compared with the experimental ones. By analyzing each process, the validity of the simulation is investigated. The simulation results include the sputtering yield, energy distribution, ejected angle dist