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The sputter deposition process: a Monte-Carlo study

โœ Scribed by Thomas Heberlein; Gunter Krautheim; Werner Wuttke


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
500 KB
Volume
42
Category
Article
ISSN
0042-207X

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๐Ÿ“œ SIMILAR VOLUMES


Monte Carlo studies of sputtering
โœ L.G. Haggmark; W.D. Wilson ๐Ÿ“‚ Article ๐Ÿ“… 1978 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 691 KB
Investigation of ion beam sputtering pro
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A simulation of ion beam sputtering for Si and Ge is carried out and the simulation results are compared with the experimental ones. By analyzing each process, the validity of the simulation is investigated. The simulation results include the sputtering yield, energy distribution, ejected angle dist