Applications of Monte Carlo simulation in the analysis of a sputter-deposition process
โ Scribed by T. Motohiro
- Book ID
- 126052716
- Publisher
- AVS (American Vacuum Society)
- Year
- 1986
- Tongue
- English
- Weight
- 791 KB
- Volume
- 4
- Category
- Article
- ISSN
- 0734-2101
- DOI
- 10.1116/1.573469
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๐ SIMILAR VOLUMES
A simulation of ion beam sputtering for Si and Ge is carried out and the simulation results are compared with the experimental ones. By analyzing each process, the validity of the simulation is investigated. The simulation results include the sputtering yield, energy distribution, ejected angle dist
An algorithm for Monte Carlo simulation of sputtered atom transport during ion-plasma sputtering was developed. The experimentally determined initial energy distribution of sputtered atoms, the influence of the background gas mixture and the real equipment geometry of the magnetron sputtering system