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Simulation of a triode plasma-assisted chemical vapour deposition system

✍ Scribed by J.H. van Breda; A.G. Dias; W.G. Haije; D.C. Schram

Book ID: 107930538
Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 322 KB
Volume: 74-75
Category: Article
ISSN: 0257-8972
DOI: 10.1016/0257-8972(95)08302-2

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