Plasma-assisted chemical vapour deposition of hard coatings with metallo-organic compounds

✍ Scribed by K.-T. Rie; A. Gebauer

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 542 KB
• Volume: 139
• Category: Article
• ISSN: 0921-5093
• DOI: 10.1016/0921-5093(91)90597-g

✦ Synopsis

In this work the use of two metallo-organic compounds, titanium tetrakisdialkylamides, was investigated with a pulsed d.c. plasma-assisted chemical vapour deposition process to deposit layers on steel substrates and hard metals. The layers have been studied by scanning electron microscopy X-ray diffraction and wavelength-dispersive X-ray analysis. It is shown that chlorine-free titanium carbonitride coatings can be obtained by metallo-organic chemical vapour deposition even at substrate temperatures of lower than 450 °C.