Plasma assisted metal-organic chemical vapor deposition of hard chromium nitride thin film coatings using chromium(III) acetylacetonate as the precursor

✍ Scribed by Arup Dasgupta; P. Kuppusami; Falix Lawrence; V.S. Raghunathan; P. Antony Premkumar; K.S. Nagaraja

• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 361 KB
• Volume: 374
• Category: Article
• ISSN: 0921-5093
• DOI: 10.1016/j.msea.2004.03.021