𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Synthesis of thin coatings by plasma-assisted chemical vapour deposition using metallo-organic compounds as precursors

✍ Scribed by K.-T. Rie; J. Wöhle; A. Gebauer

Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
521 KB
Volume
59
Category
Article
ISSN
0257-8972

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Plasma-assisted chemical vapour depositi
Plasma-assisted chemical vapour deposition of hard coatings with metallo-organic compounds
✍ K.-T. Rie; A. Gebauer 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 542 KB

In this work the use of two metallo-organic compounds, titanium tetrakisdialkylamides, was investigated with a pulsed d.c. plasma-assisted chemical vapour deposition process to deposit layers on steel substrates and hard metals. The layers have been studied by scanning electron microscopy X-ray diff

Synthesis and characterization of methyl
Synthesis and characterization of methylcyclopentadienyl-(η3-allyl)platinum and its use as a metallo-organic chemical vapour deposition precursor of platinum
✍ G. Rossetto; P. Zanella; G. Carta; R. Bertani; D. Favretto; G. M. Ingo 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 160 KB 👁 1 views

This communication reports on rapid, efficient synthesis of the metal-organic chemical vapor deposition (MOCVD) precursor (methylcyclopentadienyl)allylplatinum. The compound is shown to be an effective precursor for the deposition of platinum thin films giving deposits of high quality and purity, pr