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The formation of Ti(OCN) layers produced from metal—organic compounds using plasma-assisted chemical vapour deposition

✍ Scribed by T. Wierzchoń; J.R. Sobiecki; D. Krupa


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
399 KB
Volume
59
Category
Article
ISSN
0257-8972

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