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Plasma-assisted chemical vapour deposition in a tunable microwave cavity

โœ Scribed by Salvadori, M C; Mammana, V P; Martins, O G; Degasperi, F T

Book ID
126584458
Publisher
Institute of Physics
Year
1995
Tongue
English
Weight
381 KB
Volume
4
Category
Article
ISSN
0963-0252

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โœ Belmahi, M. ;Le Brizoual, L. ;Assouar, M. B. ;Tousch, T. ;Vergnat, M. ;Bougdira, ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 282 KB

## Abstract In this study we present the first results achieved on the growth of carbon nanotubes (CNT) in both continuous mode (CM) and pulsed mode (PM) microwave plasma assisted chemical vapour deposition (MPACVD). The interest of this work is to determine the influence of the discharge parameter