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Low temperature boron coatings by microwave plasma assisted chemical vapour deposition

✍ Scribed by V. Cholet; R. Herbin; L. Vandenbulcke

Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
913 KB
Volume
192
Category
Article
ISSN
0040-6090

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In this work the use of two metallo-organic compounds, titanium tetrakisdialkylamides, was investigated with a pulsed d.c. plasma-assisted chemical vapour deposition process to deposit layers on steel substrates and hard metals. The layers have been studied by scanning electron microscopy X-ray diff