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Titanium nitride deposited by plasma-assisted chemical vapour deposition

✍ Scribed by J. Laimer; H. Störi; P. Rödhammer

Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
862 KB
Volume
191
Category
Article
ISSN
0040-6090

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The use of a thin titanium interlayer has been found to considerably improve the adhesion of titanium nitride coatings produced by physical vapour deposition (PVD). This is believed to arise from two factors: the dissolution of weak native oxide layers by the titanium (a chemical gettering effect) a