✦ LIBER ✦

Low temperature growth of highly purified diamond films using microwave plasma-assisted chemical vapour deposition

✍ Scribed by Yasushi Muranaka; Hisao Yamashita; Hiroshi Miyadera

Book ID: 107930165
Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 699 KB
Volume: 47
Category: Article
ISSN: 0257-8972
DOI: 10.1016/0257-8972(91)90262-u

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## Abstract Nanocrystalline diamond (NCD) films were grown by microwave plasma CVD in hydrogen‐based gas mixture. Deposition experiments were performed at different temperatures varying from 370 to 1100 °C. Before growth step, silicon (100) oriented substrates were nucleated by bias enhanced nuclea