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Pulsed microwave plasma-assisted chemical vapour deposition of diamond

โœ Scribed by J. Laimer; S. Matsumoto

Book ID
113302827
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
562 KB
Volume
14
Category
Article
ISSN
0263-4368

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๐Ÿ“œ SIMILAR VOLUMES

Experimental study of a pulsed microwave
Experimental study of a pulsed microwave plasma assisted chemical vapour deposition of carbon nanotubes
โœ Belmahi, M. ;Le Brizoual, L. ;Assouar, M. B. ;Tousch, T. ;Vergnat, M. ;Bougdira, ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 282 KB

## Abstract In this study we present the first results achieved on the growth of carbon nanotubes (CNT) in both continuous mode (CM) and pulsed mode (PM) microwave plasma assisted chemical vapour deposition (MPACVD). The interest of this work is to determine the influence of the discharge parameter