𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Simple model of the lithographic response of “Hatzakis” chemically-amplified resists

✍ Scribed by PC Miller Tate; RG Jones; J Murphy; J Everett

Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
278 KB
Volume
27
Category
Article
ISSN
0167-9317

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Simulation of the Postexposure Bake Proc
Simulation of the Postexposure Bake Process of Chemically Amplified Resists by Reaction–Diffusion Equations
✍ Tsung-Lung Li 📂 Article 📅 2001 🏛 Elsevier Science 🌐 English ⚖ 149 KB

In this work, a time-dependent postexposure bake (PEB) simulator is presented by solving a set of reaction-diffusion equations modeling the deprotection reaction of polymers and the diffusion of acids in chemically amplified resists. The simulator is time-dependent in the sense that model parameters