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Silicon–germanium films prepared from SiH4 and GeF4 by low frequency plasma deposition

✍ Scribed by R Ambrosio; A Torres; A Kosarev; C Zúñiga; A.S Abramov


Book ID
116667378
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
393 KB
Volume
329
Category
Article
ISSN
0022-3093

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