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Properties of silicon nitride films prepared by plasma-enhanced chemical vapour deposition of SiH4-N2 mixtures

✍ Scribed by Hideo Watanabe; Kazuhisa Katoh; Shin-Ichi Imagi


Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
370 KB
Volume
136
Category
Article
ISSN
0040-6090

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