Composition, etching and optical properties of silicon nitride films deposited by plasma-enhanced chemical vapour deposition prepared in variable NH3N2 gas mixture diluted with Helium

✍ Scribed by B. Reynes; C. Ance; J.P. Stoquert; J.C. Bruyère

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 340 KB
• Volume: 203
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(91)90519-4