High quality silicon nitride deposited by Ar/N2/H2/SiH4 high-density and low energy plasma at low temperature

✍ Scribed by Chuan Jie Zhong; Hiroaki Tanaka; Shigetoshi Sugawa; Tadahiro Ohmi

• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 154 KB
• Volume: 37
• Category: Article
• ISSN: 0026-2692
• DOI: 10.1016/j.mejo.2005.06.007