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Silicon nitride and oxide film formation by the simultaneous use of a microwave ion source and an ICB system

โœ Scribed by Gikan H. Takaoka; Kazuoki Matsugatani; Junzo Ishikawa; Toshinori Takagi


Book ID
113279766
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
438 KB
Volume
37-38
Category
Article
ISSN
0168-583X

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