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Low temperature growth of A1n and Al2O3 films by the simultaneous use of a microwave ion source and an ionized cluster beam system

โœ Scribed by Hiroshi Takaoka; Junzo Ishikawa; Toshinori Takagi


Publisher
Elsevier Science
Year
1988
Tongue
English
Weight
827 KB
Volume
157
Category
Article
ISSN
0040-6090

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