✦ LIBER ✦
Low temperature formation of silicon nitride and oxide films by the simultaneous use of a microwave ion source and an ICB source : J. Ishikawa, K. Matsugatani and G. Takaoka. Vaccum39(11/12), 1111 (1989)
- Publisher
- Elsevier Science
- Year
- 1990
- Tongue
- English
- Weight
- 127 KB
- Volume
- 30
- Category
- Article
- ISSN
- 0026-2714
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