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Silicon growth at low temperatures: SiH4-HCl-H2 system

✍ Scribed by Hong H. Lee


Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
587 KB
Volume
69
Category
Article
ISSN
0022-0248

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Very low temperature growth of polycryst
✍ Bong Yeol Ryu; Jai Il Ryu; Hyun Chul Kim; Jin Jang πŸ“‚ Article πŸ“… 1997 πŸ› Elsevier Science 🌐 English βš– 500 KB

We have studied the growth of polycrystalline silicon by remote plasma chemical vapor deposition using a SiFd/Hz mixture at a low temperature of 1OO'C. Thin film is composed of grains in which there are many small sub-grains of less than IOnm. The film exhibited the polycrystalline volume fraction o