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Selective etching and epitaxial refilling of silicon wells in the system SiH4/HCl/H2

✍ Scribed by Manfred Druminski; Roland Gessner

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

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Rate-determining reactions and surface s

✍ W.A.P. Claassen; J. Bloem 📂 Article 📅 1981 🏛 Elsevier Science 🌐 English ⚖ 820 KB