Themodynamic Approach to Diffusion-Contr
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Dr.-Ing. W. J. Riedl
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Article
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1972
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John Wiley and Sons
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English
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Treatment of diffusion-controlled chemical vapour deposition (CDV) usually neglects supersaturation a t the gas-solid interface, which is the basic condition for crystal growth. A new approach based on metastable equilibria and on the concept of activit,y, taking into account departure from equilibr