Model on transport phenomena and epitaxial growth of silicon thin film in SiHCl3H2 system under atmospheric pressure

✍ Scribed by Hitoshi Habuka; Takatoshi Nagoya; Masanori Mayusumi; Masatake Katayama; Manabu Shimada; Kikuo Okuyama

• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 857 KB
• Volume: 169
• Category: Article
• ISSN: 0022-0248
• DOI: 10.1016/0022-0248(96)00376-4