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Rate-determining reactions and surface species in CVD of silicon: II. The SiH2Cl2-H2-N2-HCL system

✍ Scribed by W.A.P. Claassen; J. Bloem

Publisher: Elsevier Science
Year: 1980
Tongue: English
Weight: 742 KB
Volume: 50
Category: Article
ISSN: 0022-0248
DOI: 10.1016/0022-0248(80)90142-6

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