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Rate-determining reactions and surface species in CVD of silicon III. The SiH4-H2-N2 system

✍ Scribed by W.A.P. Claassen; J. Bloem

Publisher: Elsevier Science
Year: 1981
Tongue: English
Weight: 820 KB
Volume: 51
Category: Article
ISSN: 0022-0248
DOI: 10.1016/0022-0248(81)90421-8

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