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Rate-determining reactions and surface species in CVD of silicon: I. The SiH4-HCl-H2 system

✍ Scribed by J. Bloem; W.A.P. Claassen

Publisher: Elsevier Science
Year: 1980
Tongue: English
Weight: 776 KB
Volume: 49
Category: Article
ISSN: 0022-0248
DOI: 10.1016/0022-0248(80)90117-7

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The very low pressure reactor (VLPR) technique has been used to measure the bimolecular rate constant of the title reaction at 300 K. The rate constant is given by log k, (l/mol s) = (11.6 2 0.4) -(5.9 ? 0.6)/0 the equilibrium constant has also been measured at the same temperature and is given by K