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Temperature dependence of doping element incorporation with the chemical vapour deposition epitaxial silicon (VI) SiH4HClPH3H2 system

✍ Scribed by H. Kühne; Dr. R. Sperling; Th. Morgenstern


Publisher
John Wiley and Sons
Year
1980
Tongue
English
Weight
389 KB
Volume
15
Category
Article
ISSN
0232-1300

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