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Dependence of doping element incorporation on temperature in the chemical vapour deposition of epitaxial silicon (III). Empirical incorporation characteristic of the Si-P-H system

✍ Scribed by Dipl.-Chem. H. Kühne


Publisher
John Wiley and Sons
Year
1979
Tongue
English
Weight
465 KB
Volume
14
Category
Article
ISSN
0232-1300

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