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Silicon dioxide film deposited by photoassisted microwave plasma CVD using TEOS

✍ Scribed by Nobumasa Suzuki; Kazuya Masu; Kazuo Tsubouchi

Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 312 KB
Volume: 79-80
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(94)90431-6

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