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The optoelectronic properties of silicon films deposited by inductively coupled plasma CVD

โœ Scribed by Yanli Qin; Hengqing Yan; Fei Li; Li Qiao; Qiming Liu; Deyan He

Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
590 KB
Volume
257
Category
Article
ISSN
0169-4332

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