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Properties of BN thin films deposited by plasma CVD

✍ Scribed by Akiyoshi Chayahara; Haruki Yokoyama; Takeshi Imura; Yukio Osaka; Masami Fujisawa

Publisher: Elsevier Science
Year: 1988
Tongue: English
Weight: 255 KB
Volume: 33-34
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(88)90353-4

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## Abstract Plasma CVD is a candidate technology for the fabrication of optical polymer waveguides. It can deposit a film on any surface geometry and any substrate material at a temperature under 200 °C in a vacuum process. It also provides good thickness controllability and uniformity of the depos