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Characterization of a-SiC:H Films Deposited by RF Plasma CVD

✍ Scribed by Y.T. Kim; B. Hong; G.E. Jang; S.J. Suh; D.H. Yoon

Publisher
John Wiley and Sons
Year
2002
Tongue
English
Weight
437 KB
Volume
37
Category
Article
ISSN
0232-1300

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