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Plasma Characterization of Oxygen-Tetramethylsilane Mixtures for the Plasma-Enhanced CVD of SiOxCyHz Thin Films

✍ Scribed by Á. Yanguas-Gil; Á. Barranco; J. Cotrino; P. Gröning; A. R. González-Elipe

Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
362 KB
Volume
12
Category
Article
ISSN
0948-1907

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