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Growth and characterization of fluorocarbon thin films grown from trifluoromethane (CHF3) using pulsed-plasma enhanced CVD

✍ Scribed by Edmund J. Winder; Karen K. Gleason


Publisher
John Wiley and Sons
Year
2000
Tongue
English
Weight
152 KB
Volume
78
Category
Article
ISSN
0021-8995

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