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Fabrication of SiN films at low temperature by RF biased coaxial-line microwave plasma CVD

✍ Scribed by Yoshinori Morita; Isamu Kato; Tatsuji Nakajima


Publisher
John Wiley and Sons
Year
1996
Tongue
English
Weight
641 KB
Volume
79
Category
Article
ISSN
8756-663X

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