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Influence of the plasma parameters and nitrogen addition on the electrical characteristics of DLC films deposited by inductively coupled plasma deposition

✍ Scribed by Ana Paula Mousinho; Ronaldo Domingues Mansano

Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
551 KB
Volume
254
Category
Article
ISSN
0169-4332

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## Abstract Titanium dioxide (TiO~2~) films are produced by inductively coupled plasma‐assisted (ICP) CVD at various H~2~ flow rates. Anatase and rutile TiO~2~ films are obtained without any external heating. The surface morphologies, structures, and deposition rates of the TiO~2~ films are strongl